Plasma techniques for film deposition
Material type:
TextLanguage: English Publication details: Harrow Alpha Science International 2005Description: ix,337pISBN: - 1-84265-151-X
- 621.38152 K82
| Item type | Current library | Call number | Status | Date due | Barcode | Item holds | |
|---|---|---|---|---|---|---|---|
| Books | ISI Library, Kolkata | 621.38152 K82 (Browse shelf(Opens below)) | Available | 126272 |
Total holds: 0
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| 621.38152 J35 Amorphous semiconductor technologies and devices | 621.38152 J35 Semiconductor technologies | 621.38152 K49 Introductory quantum mechanics for semiconductor nanotechnology | 621.38152 K82 Plasma techniques for film deposition | 621.38152 L566 Manual for MOS users | 621.38152 M116 MOS device and circuit design | 621.38152 M257 Industrial solid-state electronics |
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