VLSI fabrication principles: (Record no. 436760)
[ view plain ]
000 -LEADER | |
---|---|
fixed length control field | 01506nam a2200241Ia 4500 |
003 - CONTROL NUMBER IDENTIFIER | |
control field | ISI Library, Kolkata |
005 - DATE AND TIME OF LATEST TRANSACTION | |
control field | 20250220120342.0 |
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION | |
fixed length control field | 250220b |||||||| |||| 00| 0 eng d |
020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
International Standard Book Number | 9788126517909 |
040 ## - CATALOGING SOURCE | |
Original cataloging agency | ISI Library |
Language of cataloging | English |
041 ## - LANGUAGE CODE | |
Language code of text/sound track or separate title | English |
082 04 - DEWEY DECIMAL CLASSIFICATION NUMBER | |
Classification number | 621.38173 |
Item number | G411 |
100 10 - MAIN ENTRY--PERSONAL NAME | |
Personal name | Ghandhi, Sorab K. |
245 10 - TITLE STATEMENT | |
Title | VLSI fabrication principles: |
Remainder of title | Silicon and Gallium Arsenide/ |
Statement of responsibility, etc | Sorab K. Ghandhi |
250 ## - EDITION STATEMENT | |
Edition statement | 2nd ed. |
260 ## - PUBLICATION, DISTRIBUTION, ETC. (IMPRINT) | |
Place of publication, distribution, etc | New Delhi: |
Name of publisher, distributor, etc | John Wiley & Sons, |
Date of publication, distribution, etc | 1994 |
300 ## - PHYSICAL DESCRIPTION | |
Extent | xxiv, 834 pages: |
Other physical details | diagrams; |
Dimensions | 23 cm. |
504 ## - BIBLIOGRAPHY, ETC. NOTE | |
Bibliography, etc | Includes bibliography and index |
505 0# - FORMATTED CONTENTS NOTE | |
Formatted contents note | Material Properties -- Phase Diagrams and Solid Solubility -- Crystal Growth and Doping -- Diffusion -- Epitaxy -- Ion Implantation -- Native Films -- Deposited Films -- Etching and Cleaning -- Lithographic Processes -- Device and Circuit Fabrication -- The Mathematics of Diffusion |
520 ## - SUMMARY, ETC. | |
Summary, etc | Fully updated with the latest technologies, this edition covers the fundamental principles underlying fabrication processes for semiconductor devices along with integrated circuits made from silicon and gallium arsenide. Stresses fabrication criteria for such circuits as CMOS, bipolar, MOS, FET, etc. These diverse technologies are introduced separately and then consolidated into complete circuits. An Instructor's Manual presenting detailed solutions to all the problems in the book is available from the Wiley editorial department. |
650 0# - SUBJECT ADDED ENTRY--TOPICAL TERM | |
Source of heading or term | Semiconductors |
942 ## - ADDED ENTRY ELEMENTS (KOHA) | |
Koha item type | Books |
Source of classification or shelving scheme | Dewey Decimal Classification |
Lost status | Not for loan | Home library | Current library | Date acquired | Full call number | Accession Number | Koha item type |
---|---|---|---|---|---|---|---|
ISI Library, Kolkata | ISI Library, Kolkata | 10/02/2025 | 621.38173 G411 | C27728 | Books |